We have investigated the correlation between the microwave loss and patterning method for coplanar waveguide titanium nitride resonators fabricated on silicon wafers. Three different methods were investigated: fluorine- and chlorine-based reactive ion etches and an argon-ion mill. At high microwave probe powers, the reactive etched resonators showed low internal loss, whereas the ion-milled samples showed dramatically higher loss. At single-photon powers, we found that the fluorine-etched resonators exhibited substantially lower loss than the chlorine-etched ones. We interpret the results by use of numerically calculated filling factors and find that the silicon surface exhibits a higher loss when chlorine-etched than when fluorine-etched. We also find from microscopy that re-deposition of silicon onto the photoresist and side walls is the probable cause for the high loss observed for the ion-milled resonators.
Skip Nav Destination
Article navigation
25 June 2012
Research Article|
June 29 2012
Etch induced microwave losses in titanium nitride superconducting resonators
Martin Sandberg;
Martin Sandberg
a)
1
National Institute of Standards and Technology
, Boulder, Colorado 80305, USA
Search for other works by this author on:
Michael R. Vissers;
Michael R. Vissers
1
National Institute of Standards and Technology
, Boulder, Colorado 80305, USA
Search for other works by this author on:
Jeffrey S. Kline;
Jeffrey S. Kline
1
National Institute of Standards and Technology
, Boulder, Colorado 80305, USA
Search for other works by this author on:
Martin Weides;
Martin Weides
b)
1
National Institute of Standards and Technology
, Boulder, Colorado 80305, USA
Search for other works by this author on:
Jiansong Gao;
Jiansong Gao
1
National Institute of Standards and Technology
, Boulder, Colorado 80305, USA
Search for other works by this author on:
David S. Wisbey;
David S. Wisbey
2
Saint Louis University
, St. Louis, Missouri 63103, USA
Search for other works by this author on:
David P. Pappas
David P. Pappas
c)
1
National Institute of Standards and Technology
, Boulder, Colorado 80305, USA
Search for other works by this author on:
a)
Electronic address: martin.sandberg@nist.gov.
b)
Current address: Karlsruhe Institute of Technology, 76131 Karlsruhe, Germany.
c)
Electronic address: david.pappas@nist.gov.
Appl. Phys. Lett. 100, 262605 (2012)
Article history
Received:
March 28 2012
Accepted:
June 01 2012
Citation
Martin Sandberg, Michael R. Vissers, Jeffrey S. Kline, Martin Weides, Jiansong Gao, David S. Wisbey, David P. Pappas; Etch induced microwave losses in titanium nitride superconducting resonators. Appl. Phys. Lett. 25 June 2012; 100 (26): 262605. https://doi.org/10.1063/1.4729623
Download citation file:
Sign in
Don't already have an account? Register
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Sign in via your Institution
Sign in via your InstitutionPay-Per-View Access
$40.00
Citing articles via
Feedback cooling of an insulating high-Q diamagnetically levitated plate
S. Tian, K. Jadeja, et al.
MXene/AlGaN van der Waals heterojunction self-powered photodetectors for deep ultraviolet communication
Linhao Li, Yixun He, et al.
Evolution of electro-induced blood plasma droplets on a superhydrophobic microstructured surface
Kaikai Li, Yingxi Xie, et al.