Towards environmentally friendly, dry deposited, water developable molecular glass photoresists
Abstract
Photoresists based on molecular glasses are gaining more and more importance as resist material to replace
* Corresponding authors
a
Makromolekulare Chemie I, Bayreuther Institut für Makromolekülforschung (BIMF) and Bayreuther Zentrum für Kolloide und Grenzflächen (BZKG), Universität Bayreuth, Bayreuth, Germany
E-mail:
hans-werner.schmidt@uni-bayreuth.de
b
Department of Materials Science and Engineering, Cornell University, Ithaca NY 14853, USA
E-mail:
cober@ccmr.cornell.edu
Photoresists based on molecular glasses are gaining more and more importance as resist material to replace
F. Pfeiffer, N. M. Felix, C. Neuber, C. K. Ober and H. Schmidt, Phys. Chem. Chem. Phys., 2008, 10, 1257 DOI: 10.1039/B715819J
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