Condensed Matter > Materials Science
This paper has been withdrawn by Tianhong Gu
[Submitted on 6 Apr 2021 (v1), last revised 20 Oct 2023 (this version, v2)]
Title:Accessing slip activity in high purity tin with electron backscatter diffraction and measurement of slip strength
No PDF available, click to view other formatsAbstract:Beta-tin has been used widely as an interconnect in modern electronics. To improve the understanding of the reliability of these components, we directly measure the critical resolved shear stress of individual slip systems in beta-tin using micropillar compression tests at room temperature with crystal orientations near-[100] and [001] in the loading direction within a large grain high purity tin (99.99%) sample. This activates the (110)[1-11]/2, (110)[1-1-1]/2, (010)[001] and (110)[001] slip systems. Analysis of the slip traces and load-displacement curves enables measurement of the critical resolved shear stress for epsilon=10^(-4) of tau_(CRSS)^({110}<1-11>/2)=10.4+/-0.4 and tau_(CRSS)^({010}<001>)=3.9+/-0.3 MPa.
Submission history
From: Tianhong Gu [view email][v1] Tue, 6 Apr 2021 17:19:07 UTC (635 KB)
[v2] Fri, 20 Oct 2023 07:58:58 UTC (1 KB) (withdrawn)
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