A Simulation Study on Figure Error Correction Using Near-Gaussian Removal Function in Numerical Controlled Local Wet Etching

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Abstract:

Local wet etching (LWE) is a non-conventional deterministic surface figuring and finishing technique in ultra-precision optics fabrication fields. The general removal function in LWE is cylinder, so fringe of the removal function is sharp and scale of the removal function is determined by inner diameter of the nozzle head. When fabricating some specimen with high frequency figure error, ideal designed shape can’t be achieved easily. Compared with general LWE removal function, Gaussian removal function is more suitable for figuring owing to its smoother fringe and the centralization of its energy. At the same time Gaussian removal function can improve the efficiency in calculation of the dwelling time, because it’s very suitable for Fourier transform. What’s more, theoretical residual figure error can also be reduced for Gaussian removal function’s high spatial resolution. Ideal Gaussian function is difficult to obtain in LWE, so we have proposed near-Gaussian removal function by eccentric rotation of the nozzle head. Through controlling offset of the eccentric rotation, we achieve the optimal near-Gaussian removal function in LWE. Aims of the introduction of near-Gaussian removal function in LWE are to improve the fabrication efficiency and to remove the surface’s high frequency residual figure error.

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Periodical:

Key Engineering Materials (Volumes 523-524)

Pages:

276-280

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Online since:

November 2012

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[1] K. Yamamura, Development of numerically controlled local wet etching, Science and Technology of Advanced Materials 8 (2007) 158-161.

DOI: 10.1016/j.stam.2007.02.003

Google Scholar

[2] K. Yamamura, Fabrication of Ultra-Precision Optics by Numerically Controlled Local Wet Etching, Annals of the CIRP 56 (2007) 541-544.

DOI: 10.1016/j.cirp.2007.05.129

Google Scholar

[3] K. Yamamura, M. Nagano, H. Takai, N. Zettsu, D. Yamazaki, R. Maruyama, K. Soyama, S. Shimad, Figuring of plano-elliptical neutron focusing mirror by local wet etching, Opt. Express 17 (2009) 6414-6420.

DOI: 10.1364/oe.17.006414

Google Scholar

[4] K. Yamamura, K.Ueda, M.Nagano, N. Zettsu, S. Maeo, S. Shimada, T. Utaka, K. Taniguchi, Fabrication of damage-free Johansson-type doubly curved crystal spectrometer substrate by numerically controlled local wet etching, Nucl. Instr. and Meth. A 616(2010) 281–284.

DOI: 10.1016/j.nima.2009.12.006

Google Scholar

[5] K. Yamamura, M. Nagano, N. Zettsu, D. Yamazaki, R. Maruyama, K. Soyama, High-reflectivity(m=4) elliptical neutron focusing super mirror fabricated by numerically controlled local wet etching with ion beam sputter deposition, Nucl. Instr. and Meth. A 616 (2010) 193–196.

DOI: 10.1016/j.nima.2009.11.070

Google Scholar

[6] C. Jiao, S. Li, and X. Xie, Algorithm for ion beam figuring of low-gradient mirrors, Appl. Opt. 48 (2009) 4090–4096.

DOI: 10.1364/ao.48.004090

Google Scholar

[7] H. Hu, Y. Dai, and X. Peng, Restraint of tool path ripple based on surface error distribution and process parameters in deterministic finishing, Opt. Express 18 (2010) 22973–22981.

DOI: 10.1364/oe.18.022973

Google Scholar

[8] Y. Dai, C. Song, X. Peng, and F. Shi, Calibration and prediction of removal function in magnetorheological finishing, Appl. Opt. 49 (2010) 298–305.

DOI: 10.1364/ao.49.000298

Google Scholar