Fabrication of Aluminum Doped Silica Preform Using MCVD and Solution Doping Technique: Soot Analyses and Solution Concentration Effect

Salah Mohammed Aljamimi; Z. Yusoff; H.A. Abdul-Rashid; Khairul M.S. Anuar; S.Z. Muhamad Yassin; M.I. Zulkifli; S. Hanif; N. Tamchek

doi:10.4028/www.scientific.net/AMR.896.197

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 896Fabrication of Aluminum Doped Silica Preform Using...

Fabrication of Aluminum Doped Silica Preform Using MCVD and Solution Doping Technique: Soot Analyses and Solution Concentration Effect

Abstract:

This work is part of a study of solution doping in Modified Chemical Vapor Deposition (MCVD) used for silica optical fiber fabrication. This paper will concentrate on soot characterstics and the effect of different aluminum solution concentration. The effect of three different concentration of aluminum (0.3M,0.7M and 1.2M) with heat treatment are studied while the other parameters of MCVD and solution doping are fixed such as deposition temperature, SiCl₄ flow, and soaking time. The porous core layer is deposited at 1800°C and the porosity of the deposited porous layer is analyzed using gas adsorption method. Refractive index profile of the doped preform is measured using preform analyzer. The aluminum distribution across the sintered glass layer is also examined by EDX.

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Periodical:

Advanced Materials Research (Volume 896)

Pages:

197-202

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.896.197

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Online since:

February 2014

Authors:

Salah Mohammed Aljamimi*, Z. Yusoff, H.A. Abdul-Rashid, Khairul M.S. Anuar, S.Z. Muhamad Yassin, M.I. Zulkifli, S. Hanif, N. Tamchek

Keywords:

Aluminum Doped Silica Preform, EPMA (SEM-EDX), MCVD (Vapor Phase), Porosity Analyses, Refractive Index Profile, Solution Doping (Liquid Phase) Technique, Soot Analyses

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