Silicon Electrochemical Etching for 3D Microforms with High Quality Surfaces

Alexey Ivanov; Ulrich Mescheder

doi:10.4028/www.scientific.net/AMR.325.666

Paper Titles

A Study of Jet Formation for Premixed Slurry Jet Nozzle Using the Discrete Phase Model
p.638

Evaluation of Surface Roughness of Quartz Glass Substrate in Fabrication Process for Neutron Focusing Mirror
p.647

On-Machine Measurement and Statistical Analysis of Wheel Wear after Grinding Optical Glass
p.653

Influence of Wafer Grinding and Etching Techniques on the Fracture Strength of Thin Silicon Substrates
p.659

Silicon Electrochemical Etching for 3D Microforms with High Quality Surfaces
p.666

Spectroscopic Measurements of Silicon Wafer Thickness for Backgrinding Process
p.672

Development of CMG Wheels for Stress Relief in Si Wafer Thinning Process
p.678

On the Reliability of Nanoindentation on Si Wafer at Elevated Temperatures
p.684

Evaluation of Hard Materials Using Eco-Attributes
p.693

HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 325Silicon Electrochemical Etching for 3D Microforms...

Silicon Electrochemical Etching for 3D Microforms with High Quality Surfaces

Abstract:

In this paper the process of silicon anodization as a structuring technique is discussed. 3D-structuring is achieved by 3D control of current density in an anodization process. In contrast to conventional ECM techniques electrodes as structured thin layers on the work piece are used. For the shape controlling of etch form frontside masking design and local backside doping are presented. Influences of the opening size and etch depth on the shape of the etch form is shown. The surface quality of the resulting 3D structures is investigated, with best surface quality (about 1 nm rms) being obtained for electropolishing in 7 wt.% HF at applied current densities of 100 ‑ 300 mA/cm². Application of 3D silicon forms for injection moulding is demonstrated and further implementations of the process for optical and fluidic devices are discussed.

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Periodical:

Advanced Materials Research (Volume 325)

Pages:

666-671

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.325.666

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Online since:

August 2011

Authors:

Alexey Ivanov, Ulrich Mescheder

Keywords:

Electrochemical Etching, Electropolishing, Micromoulds, Silicon Anodization

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References

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