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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 1087The Effect of Substrate on TiO2 Thin Films...

The Effect of Substrate on TiO₂ Thin Films Deposited by Atomic Layer Deposition (ALD)

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Abstract:

ALD is a precision growth technique that can deposit either amorphous or polycrystalline thin films on a variety of substrates. The difference in substrate can cause a variation in the ALD process, even it is carried out using the same reactants and deposition conditions [1]. TiO₂ thin films were grown using TTIP (Titanium isopropoxide) ALD on silicon wafers, glass slides, and stainless steel plates in order to study the effect of substrates on the growth of TiO₂ with 3,000 deposition cycles, at 300°C.The thin films were analyzed using Xray Diffraction (XRD), Raman Spectroscopy, Atomic Force Microscope (AFM) and Spectroscopic Ellipsometer. From XRD analysis were indicates the main peak for anatase (101) (2θ= 25.3) was observed from the XRD patterns for TiO₂ on all substrates. The results show that crystalline TiO₂ thin films can easily grow on a crystal substrate rather than on an amorphous substrate.

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Periodical:

Advanced Materials Research (Volume 1087)

Pages:

147-151

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.1087.147

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Online since:

February 2015

Authors:

Rosniza Hussin*, Kwang Leong Choy, Xiang Hui Hou

Keywords:

Atomic Layer Deposition (ALD), Deposition, Substrate, Thin Film, TiO₂ (Titanium Oxide)

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