Evaluation on the Photoabsorber Composition Effect in Projection Microstereolithography

Raman Ibrahim; Ibrahim Raman; Mohd Hafizul Hanif Ramlee; Mohammad Asraf Shaik Mohamed; Mustaffa Ibrahim; Wahab Saidin

doi:10.4028/www.scientific.net/AMM.159.109

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 159Evaluation on the Photoabsorber Composition Effect...

Evaluation on the Photoabsorber Composition Effect in Projection Microstereolithography

Abstract:

This paper presents a research progress on composition photoabsorber effect the solidification time and layer thickness of 3D structures fabrication using Liquid Crystal Display (LCD) projector as energy light source to initiate the photoreactive polymer. The polymer based material with composition of 1,6-Hexanediol dicrylate, Phenylbis(2,4,6-trimethylbenzoyl)- phosphine oxide with varied Sudan I concentrations was used to build 3D structures. The structure was fabricated using a three different photo absorber composition of Sudan I then the photoreactive polymer solidification phe¬nomena was evaluated. Based on the result obtained, higher exposed time of the photo absorber will reduced the surface roughness values and increased the solidification layer time. This work represents that photo absorber composition solution gave a different characteristics for 3D microstructure fabrication.

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Periodical:

Applied Mechanics and Materials (Volume 159)

Pages:

109-114

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.159.109

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Online since:

March 2012

Authors:

Raman Ibrahim, Ibrahim Raman, Mohd Hafizul Hanif Ramlee, Mohammad Asraf Shaik Mohamed, Mustaffa Ibrahim, Wahab Saidin

Keywords:

3D Microstructure, Exposed Time, Layer Thickness, Microstereolithography Photoreactive Polymer, Photoabsorber, Rapid Prototyping (RP)

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