Influence of Substrate Temperature and Post-Annealing Treatment on the Microstructure and Electric Properties of ZnO:Al Thin Films Deposited by Sputtering

Cibeli B. Garcia; Edith Ariza; Carlos J. Tavares

doi:10.4028/www.scientific.net/MSF.730-732.215

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HomeMaterials Science ForumMaterials Science Forum Vols. 730-732Influence of Substrate Temperature and...

Influence of Substrate Temperature and Post-Annealing Treatment on the Microstructure and Electric Properties of ZnO:Al Thin Films Deposited by Sputtering

Abstract:

In this work, it is reported the characterization of the microstructure and electric properties of ZnO:Al thin films produced by magnetron sputtering. An AZOY sputtering target (98 wt% ZnO + 2 wt% Al₂O₃) was used as source material. The microstructure, optical and electrical properties of ZnO:Al thin films were investigated and correlated with substrate deposition temperature and post-annealing temperature. It is demonstrated that the microstructural, electrical and optical properties of the as-deposited thin films are dependent on the substrate temperature. The crystalline texture of ZnO:Al was improved with temperature deposition as shown in the EBSD analysis and X-ray diffraction. ZnO:Al thin film deposited at 250 °C exhibited very good electrical conductivity, as high as 200 S^.cm^-1 with an activation energy of 5.4 meV. As substrate temperature or heat treatment temperature is increased there is an apparent blue-shift on the absorption edge of the transmittance spectra, which can be explained by the Burnstein-Moss effect.

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Periodical:

Materials Science Forum (Volumes 730-732)

Pages:

215-220

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.730-732.215

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Online since:

November 2012

Authors:

Cibeli B. Garcia, Edith Ariza, Carlos J. Tavares

Keywords:

EBSD, Sputtering, TCO, ZnO:Al

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