Improving the Deposition Rate of Multicomponent Coating by Controlling Substrate Table Rotation in a Magnetron Sputtering Process

Julfikar Haider; M.S.J. Hashmi

doi:10.4028/www.scientific.net/AMR.83-86.977

Paper Titles

Rheological Investigation of Water Atomized Metal Injection Molding (MIM) Feedstock for Processibility Prediction
p.945

Experimental Study on the Heat Transfer in the Al Powder
p.953

Explosive Compaction of Metal Powder
p.959

Study the Re-Sticky Phenomenon of Powder Metallurgy Debris in the Electrical Discharge Machining
p.968

Improving the Deposition Rate of Multicomponent Coating by Controlling Substrate Table Rotation in a Magnetron Sputtering Process
p.977

Coating Performance in High Speed Micro Machining of H13 Tool Steel
p.985

Experimental Determination of Cutting Temperature and Force when Turning Assab Steel with Coated Carbide Inserts
p.993

Study of Ultrasonically Assisted Internal Grinding of Small Holes: Effect of Grain Size of cBN Grinding Wheel
p.1002

Prediction and Investigation of Surface Response in High Speed End Milling of Ti-6Al-4V and Optimization by Genetic Algorithm
p.1009

HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 83-86Improving the Deposition Rate of Multicomponent...

Improving the Deposition Rate of Multicomponent Coating by Controlling Substrate Table Rotation in a Magnetron Sputtering Process

Abstract:

Physical Vapour Deposition (PVD) technology, particularly magnetron sputtering process, enjoys the competitive advantages of depositing different new generation coatings (e.g., multicomponent, multilayer, graded, composite etc.) on three-dimensional objects (substrate) with excellent mechanical and tribological properties. In an industrial-scale sputtering chamber with a limited number of active magnetron sources (target) on the chamber wall, the density of coating species from different sources would not be uniform everywhere around the chamber. As a result, at a constant speed of rotating substrate table in a single revolution, the instantaneous deposition rate will be highest in front of the active targets and lowest when the substrate moves away from the active targets. In this work, a method of controlling the rotational speed (i.e., slower speed in front of active targets and faster speed in front of inactive targets in a revolution) of a substrate table installed in a magnetron sputtering chamber has been developed in order to improve the deposition rate of a multicomponent TiN+MoSx coating. The mechanical and tribological properties of TiN+MoSx coating have also been characterised to assess the beneficial effects of adding solid lubricant (MoS2) in hard TiN coating.