The Effect of Sputtering Power on the Properties of Zr-Ga Co-Doped ZnO Films by DC Magnetron Sputtering

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Abstract:

Zr-Ga co-doped ZnO transparent conductive films were prepared on glass substrates by DC magnetron sputtering at room temperature. The influence of sputtering power on the structural, electrical and optical properties of Zr-Ga co-doped ZnO films was investgated by X-ray diffraction, scanning electron microscopy (SEM), digital four-point probe and optical transmission spectroscopy. The lowest resistivity of the Zr-Ga co-doped ZnO films is 3.02×10-4Ω﹒cm and the average transmittance of the films is over 90% in the visible range. The obtained optical band gap of these films is much larger than of pure ZnO (3.34 eV).

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75-80

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April 2013

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[1] CAGLAR M., ILICAN S., CAGLAR Y., Electrical conductivity and optical properties of ZnO nanostructured thin film, Appl Surf Sci Pages, 255(3), 4491-4496 (2009).

DOI: 10.1016/j.apsusc.2008.11.055

Google Scholar

[2] Cho S, Ma J, Kim H, Photoluminescence and ultraviolet lasing of polycrystalline ZnO thin films prepared by the oxidation of the metallic Zn, Appl Phys Lett 75(18), 27612-2763(2004).

DOI: 10.1063/1.125141

Google Scholar

[3] YUAN Yuzhen, WANG Hui, LIU Hanfa, ZHANG Huafu, LIU Yunyan, Effects of sputtering power on the structure and photoelectrical properties of Zr, Al co-doped ZnO thin films, Electronic components and materials. Papers 29(2), 48-50 (2010).

Google Scholar

[4] WANG Hui, YUAN Yuzhen, LIU Hanfa, ZHANG Huafu, LIU Yunyan, Co-doped ZnO-based transparent conducting thin film used in solar cells , Acta Energiae Solaris Sinica. Papers 32(4), 476-480 (2011).

Google Scholar

[5] ABDUEV A K, AKHMEDOV A K, ASVAROV A S. The structural and electrical properties of Gd-doped ZnO and Ga, B-codoped ZnO thin films: the effects of additional boron impurity, Sol Energy Mater Sol Cells Papers 91(4), 258-260 (2007).

DOI: 10.1016/j.solmat.2006.09.008

Google Scholar

[6] Lee Kyu-Ⅱ,Kang Hyun-Ⅱ,Lee Tae-Yong, Structural and Electrical Properties of Al-doped ZnO and Al, B-Codoped ZnO Films Deposited on Flexible Substrate, Journal of the Korean Physical Society Papers 53(5), 2407-2410(2008).

DOI: 10.3938/jkps.53.2407

Google Scholar

[7] Ma Q. B. ,Ye Z. Z. ,He H. P., Structural, Electrical and Optical Properties of Transparent Conductive ZnO: Ga Films Prepared by DC Reactive Magnetron Sputtering, Journal of Crystal Growth. Papers 304(1), 64-68 (2007).

DOI: 10.1016/j.jcrysgro.2007.01.037

Google Scholar

[8] Ma H B, Cho J S, Park C H. A study of indium tin oxide thin film deposited at low temperature using facing target sputtering system, Surf Coat Technol Pages 153(2), 131-134(2002).

DOI: 10.1016/s0257-8972(01)01693-0

Google Scholar

[9] Nisha M, Anusha S, Antony A, Effect of substrate temperature on the growth of ITO thin films, Appl Surf Sci Pages 252 (5), 1430-1432(2005).

DOI: 10.1016/j.apsusc.2005.02.115

Google Scholar

[10] Meng Z G, Peng H J, Wu C Y, Room temperature deposition of thin-film indium-tin oxide on micro-fabricated color filters and its application to flat-panel displays, Journal of Optoelectronics Laser. Pages 16(2), 140 (2008).

DOI: 10.1889/1.1824247

Google Scholar

[11] T. M. S. D., Present status of transparent conducting oxide thin-film development for indiumtin-oxide (ITO) substitutes, Thin Solid Films. Pages 516(17), 5822 (2008).

DOI: 10.1016/j.tsf.2007.10.063

Google Scholar