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Non-isothermal phenomena in Mo/Si diffusion couple: Reaction kinetics and structure formation

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Abstract

Macrokinetic features and mechanism of Mo-Si reaction in conditions of rapid heating on a single particle level (Mo/Si diffusion couple) were studied by high-speed scanning electrothermography. The experiments were conducted in the temperature-time conditions (T = 1000–1600°C, t = 0.01–3.0 s) comparable to those of combustion synthesis of molybdenum disilicide. The rates of chemical heat release (depending on the thickness of silicon layer, δSi) were measured and the processes of phase/structure formation were explored. Over a wide range of δSi, two-stage chemical heat release was associated with occurrence of solid-solid Mo(s) + Si(s) (for T < T Simp ) and solid-liquid Mo(s) + Si(l) reactions (for T > T Simp ), where T Simp stands for the melting point of Si. Proposed was a new mechanism for siliconization of Mo in non-isothermal conditions.

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Correspondence to S. L. Kharatyan.

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Kharatyan, S.L., Chatilyan, H.A., Aghayan, M.A. et al. Non-isothermal phenomena in Mo/Si diffusion couple: Reaction kinetics and structure formation. Int. J Self-Propag. High-Temp. Synth. 22, 18–26 (2013). https://doi.org/10.3103/S1061386213010044

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  • DOI: https://doi.org/10.3103/S1061386213010044

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