Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers
Xavier Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, Philippe Bézard, Matthieu Sérégé, Camille Petit-Etienne, Guillaume Gay, Gilles Cunge, Benjamin Cabannes-Boué, Célia Nicolet, Christophe Navarro, Ian Cayrefourcq, Marcus Müller, Georges Hadziioannou, Ilias Iliopoulos, Guillaume Fleury, Marc Zelsmann
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Keywords: Lithography, Block copolymers, Self-assembly, Cross-linkable top-coats, Top-coat patterning, Nanopatterning, Dewetting
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2021 Volume 34 Issue 1 Pages 11-16

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Abstract

A concept of patternable top-coats dedicated to directed self-assembly of high-χ block copolymers is detailed, where the design enables a crosslinking reaction triggered by thermal or photo-activation. Nanostructured BCP areas with controlled domains orientation are selected through a straightforward top-coat lithography step with unique integration pathways. Additionally, the crosslinked nature of the material enables the suppression of the BCP dewetting, while exhibiting exceptional capabilities for the construction of 3D stacks.

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© 2021 The Society of Photopolymer Science and Technology (SPST)
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