Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
New Antireflective Coating Materials Containing a Novel Chromophore for KrF Laser Lithography
Kwang-Duk Ahn, Dong Keun Han, Jun-Young Kim, Seong-Hyun Ha, Dae-Youp Lee, Jeong-Lim Nam
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Keywords: antireflective coating (ARC), KrF lithography, bottom ARC (BARC) materials, isoflavone and flavone chromophores, isoflavone polymers as BARC materials
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2001 Volume 14 Issue 3 Pages 475-480

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© The Technical Association of Photopolymers, Japan
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