Atomically controlled oxidation of MXene surfaces; how to achieve full coverage and beyond while circumventing the favored formation of oxides.

Abstract number
338
DOI
338
Corresponding Email
[email protected]
Authors
(2), (2), (1), (1), (2), (2), (2), (2)
Affiliations
1. DTU Danchip/CEN
2. Linköping University