skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Calculations of material removal, removal rate, and Preston coefficient in continuous lapping/polishing machines

Technical Report ·
DOI:https://doi.org/10.2172/10193440· OSTI ID:10193440

Lapping and polishing machines usually do not have deterministic model to pre-determine removal rate and total material to be removed. The removal process is mainly affected by relative motion between the lap and the substrates, by load applied, and by mechano-chemical characteristics of the substrate material, as well as the abrasive and lap materials. Therefore, frequent measurements of the removal is necessary. This paper, written for optical technicians, includes formulas to calculate material removal from mass loss and removal rate from mass loss during operation. Establishing the removal rate helps by reducing the frequency of intermediate thickness measurements. The paper also includes the calculation of Preston coefficient, which is a measure of lapping process efficiency.

Research Organization:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
10193440
Report Number(s):
UCRL-ID-115321; ON: DE94002619
Resource Relation:
Other Information: PBD: 18 Oct 1993
Country of Publication:
United States
Language:
English

Similar Records

Contributions of kinematics and viscoelastic lap deformation on the suface figure during full aperture polishing of fused silica
Conference · Tue Oct 09 00:00:00 EDT 2007 · OSTI ID:10193440

Material removal and surface figure during pad polishing of fused silica
Journal Article · Mon May 04 00:00:00 EDT 2009 · Journal of American Ceramic Society, vol. 93, no. 5, April 1, 2010, pp. 1325-1340 · OSTI ID:10193440

Using quantum dots to tag subsurface damage in lapped and polished glass samples
Journal Article · Sun Sep 20 00:00:00 EDT 2009 · Applied Optics · OSTI ID:10193440