Lanthanum fluoride thin films were prepared on silica glass substrates by a sol-gel method using trifluoroacetic acid (TFA) as a fluorine source. A coating solution was produced from lanthanum acetate and trifluoroacetic acid dissolved in 2-propanol. Triuoroacetate gel films were formed by spin coating the sol, which were converted to LaF₃ thin films by heat-treatment at 300-500°C for 10min. The formation of LaF₃ is considered to result from the reaction between lanthanum ions and the fluorine species generated by the decomposition of trifluoroacetate ions at elevated temperatures. The film fired at 300°C had a smooth surface with a grain size of 30nm. Cracks and voids were only observed in the films fired at 400 and 500°C. The films fired at 300 and 400°C exhibited transmittance of greater than 90% in the visible region.