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https://doi.org/10.18429/JACoW-FEL2019-WEP079
Title Effect of Heat Load on Cryo-Cooled Monochromators at the European X-Ray Free-Electron Laser: Simulations and First Experimental Observations
Authors
  • I. Petrov, U. Boesenberg, M. Dommach, J. Eidam, J. Hallmann, K. Kazarian, C. Kim, W. Lu, A. Madsen, J. Möller, M. Reiser, L. Samoylova, R. Shayduk, H. Sinn, V. Sleziona, A. Zozulya
    EuXFEL, Schenefeld, Germany
  • J.W.J. Anton, S.P. Kearney, D. Shu
    ANL, Lemont, Illinois, USA
  • X. Dong
    SINAP, Shanghai, People’s Republic of China
  • X. Dong
    SARI-CAS, Pudong, Shanghai, People’s Republic of China
Abstract European XFEL (EuXFEL) generates high-intensity ultra-short pulses at MHz repetition rate. At hard X-ray instruments, cryo-cooled silicon monochromators are used to reduce pulse bandwidth. Here, first experimental observations during commissioning of a cryo-cooled monochromator at Materials Imaging and Dynamics (MID) instrument are presented and compared with heat flow simulations. A thermal relaxation time is estimated and compared with arrival time interval between pulses. This provides the repetition rate tolerable for stable operation of monochromator.
Paper download WEP079.PDF [0.464 MB / 4 pages]
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Conference FEL2019
Series Free Electron Laser Conference (39th)
Location Hamburg, Germany
Date 26-30 August 2019
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Volker R.W. Schaa (GSI, Darmstadt, Germany); Winfried Decking (DESY, Hamburg, Germany); Harald Sinn (EuXFEL, Schenefeld, Germany); Gianluca Geloni (EuXFEL, Schenefeld, Germany); Siegfried Schreiber (DESY, Hamburg, Germany); Michaela Marx (DESY, Hamburg, Germany)
Online ISBN 978-3-95450-210-3
Online ISSN ""
Received 19 August 2019
Accepted 25 August 2019
Issue Date 05 November 2019
DOI doi:10.18429/JACoW-FEL2019-WEP079
Pages 502-505
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.