Title |
Effect of Heat Load on Cryo-Cooled Monochromators at the European X-Ray Free-Electron Laser: Simulations and First Experimental Observations |
Authors |
- I. Petrov, U. Boesenberg, M. Dommach, J. Eidam, J. Hallmann, K. Kazarian, C. Kim, W. Lu, A. Madsen, J. Möller, M. Reiser, L. Samoylova, R. Shayduk, H. Sinn, V. Sleziona, A. Zozulya
EuXFEL, Schenefeld, Germany
- J.W.J. Anton, S.P. Kearney, D. Shu
ANL, Lemont, Illinois, USA
- X. Dong
SINAP, Shanghai, People’s Republic of China
- X. Dong
SARI-CAS, Pudong, Shanghai, People’s Republic of China
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Abstract |
European XFEL (EuXFEL) generates high-intensity ultra-short pulses at MHz repetition rate. At hard X-ray instruments, cryo-cooled silicon monochromators are used to reduce pulse bandwidth. Here, first experimental observations during commissioning of a cryo-cooled monochromator at Materials Imaging and Dynamics (MID) instrument are presented and compared with heat flow simulations. A thermal relaxation time is estimated and compared with arrival time interval between pulses. This provides the repetition rate tolerable for stable operation of monochromator.
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Paper |
download WEP079.PDF [0.464 MB / 4 pages] |
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Conference |
FEL2019 |
Series |
Free Electron Laser Conference (39th) |
Location |
Hamburg, Germany |
Date |
26-30 August 2019 |
Publisher |
JACoW Publishing, Geneva, Switzerland |
Editorial Board |
Volker R.W. Schaa (GSI, Darmstadt, Germany); Winfried Decking (DESY, Hamburg, Germany); Harald Sinn (EuXFEL, Schenefeld, Germany); Gianluca Geloni (EuXFEL, Schenefeld, Germany); Siegfried Schreiber (DESY, Hamburg, Germany); Michaela Marx (DESY, Hamburg, Germany) |
Online ISBN |
978-3-95450-210-3 |
Online ISSN |
"" |
Received |
19 August 2019 |
Accepted |
25 August 2019 |
Issue Date |
05 November 2019 |
DOI |
doi:10.18429/JACoW-FEL2019-WEP079 |
Pages |
502-505 |
Copyright |
Published by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI. |
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