Porous nitride semiconductors are a fast-developing area of study, which open up a wide range of new properties and applications, including strain free optical reflectors, chemical sensors and as a pathway to device lift-off. This article reviews the current progress in porous nitrides formed through electrochemical and photoelectrochemical methods. Using a simple electrochemical cell, pores are formed by injecting holes into the surface layer in order to oxidise the material into a soluble form and releasing nitrogen gas. The process is controlled principally by the electric field that drives the injection of holes and hence the applied potential and doping density are the key parameters for controlling pore morphology, along with how and whether illumination is used. We describe the mechanisms responsible for this process in detail and outline the trends for changing pore size and pore shape. For example, larger applied potential creates a larger electric field and hence larger pores. These methods have been used to produce a wide variety of different structures. We present a layered porous structure created by the modulation of the applied potential. Alternatively, layered structures can be produced by growing alternate doped and non-intentionally doped layers. Electrochemical etching can then create pores only in the doped layers, as they are conductive. This process can be performed by etching laterally through access trenches that expose the doped material or through the etching of dislocations to create nanopipes that allow subsurface porosity to form. This process requires no prior processing steps. We combine this method with patterning of surface protective layers to influence where the resulting pores grow. Based on these various fabrication processes, significant progress has been made towards applications of porous GaN across optoelectronics, sensing and for improving material quality.