High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes) An International Journal

ISSN for PRINT: 1093-3611

For Online Access

Best Paper Award Selection - Editorial Board Site

2004, Volume8

Issue 4

169 pages

DOI: 10.1615/HighTempMatProc.v8.i4

Issue price - $144.00

L. Marques
Centro de Fisica dos Plasmas, Instituto Superior Tecnico, 1049-001 Lisboa; and Departamento de Fisica, Universidade do Minho, 4710-057 Braga, Portugal

J. Jolly
Lab. de Physique et Technologie des Plasmas, Ecole Polytechnique, 91128 Palaiseau Cedex, France

G. Gousset
Lab. de Physique des Gaz et des Plasmas, Universite Paris-Sud, 91405 Orsay Cedex, France

L. L. Alves
Centro de Fisica dos Plasmas, Instituto Superior Tecnico, 1049-001 Lisboa, Portugal

This paper presents a systematic characterization of hydrogen capacitively coupled very high frequency discharges, produced within a parallel plate cylindrical setup, by comparing numerical simulations to experimental measurements for various plasma parameters. A good quantitative agreement is found between calculation and experiment for the coupled electrical power and the plasma potential, at various frequencies, pressures and applied voltages. However, the model generally underestimates the electron density and the self-bias potential with respect to measured values. Model predictions for the absolute density of H(n=l) atoms are compared to first diagnostic results, obtained by two-photon absorption laser-induced fluorescence diagnostics at various pressures and frequencies.

DOI: 10.1615/HighTempMatProc.v8.i4.20 Download article, 499-518 pages

Article price - $35.00

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