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Ge quantum well plasmon-enhanced quantum confined Stark effect modulator

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Abstract

We theoretically and experimentally investigate a novel modulation concept on silicon (Si) based on the combination of quantum confinement and plasmon enhancement effects. We experimentally study the suitability of Ge/SiGe quantum wells (QWs) on Si as the active material for a plasmon-enhanced optical modulator. We demonstrate that in QW structures absorption and modulation of light with transverse magnetic (TM) polarization are greatly enhanced due to favorable selection rules. Later, we theoretically study the plasmon propagation at the metal-Ge/SiGe QW interface. We design a novel Ge/SiGe QW structure that allows maximized overlap between the plasmonic mode and the underlying Ge/SiGe QWs.

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References

  1. D. A. B. Miller, “Device Requirements for Optical Interconnects to Silicon Chips,” Proc. IEEE 97, 1166–1185 (2009).

    Article  CAS  Google Scholar 

  2. G. Bastard, Wave Mechanics Applied to Semiconductor Heterostructures (Les Editions de Physique, Les Ulis, 1988).

    Google Scholar 

  3. G. Isella, D. Chrastina, B. Rössner, T. Hackbarth, H.-J. Herzog, U. König, and H. von Känel, Solid State Electron. 48, 1317 (2004).

    Article  CAS  Google Scholar 

  4. E. D. Palik, Handbook of Optical Constants (Academic, 1985).

    Google Scholar 

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Authors and Affiliations

  1. IEF, Université Paris-Sud, CNRS, 15 rue Andrè Ampère, 91405, Orsay, France

    P. Chaisakul, D. Marris-Morini, N. Abadía & L. Vivien

  2. L-NESS, Politecnico di Milano, Polo di Como, Via Anzani 42, I 22100, Como, Italy

    J. Frigerio, G. Isella & D. Chrastina

  3. CEA-LETI, MINATEC Campus, 17 rue des Martyrs, 38054, Grenoble, France

    N. Abadía, S. Olivier & R. Espiau de Lamaestre

  4. ICB, Université de Bourgogne, CNRS, 9 Avenue Alain Savary, 21078, Dijon, France

    T. Bernardin & J.-C. Weeber

Authors
  1. P. Chaisakul
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  2. D. Marris-Morini
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  3. N. Abadía
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  4. J. Frigerio
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  5. G. Isella
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  6. D. Chrastina
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  7. S. Olivier
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  8. R. Espiau de Lamaestre
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  9. T. Bernardin
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  10. J.-C. Weeber
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  11. L. Vivien
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Chaisakul, P., Marris-Morini, D., Abadía, N. et al. Ge quantum well plasmon-enhanced quantum confined Stark effect modulator. MRS Online Proceedings Library 1627, 960 (2014). https://doi.org/10.1557/opl.2014.124

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  • DOI: https://doi.org/10.1557/opl.2014.124

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