Abstract
In this work, we design and fabricate a GaAs quantum ring infrared photodetector. The lattice matched GaAs/Al0.3Ga0.7As quantum rings are grown by using molecular beam epitaxy technique. The morphology of the quantum rings are characterized by an atomic force microscopy. Normal incident configured photodetectors are fabricated by standard photolithography. The photoresponse spectra are measured by a Fourier transform infrared spectrometer and exhibit two broad bands in visible-near-infrared and mid-infrared spectral range. Using quantum rings as absorption medium, we observed visible-near-infrared response at a temperature as high as 300 K while mid-infrared response up to 140 K.
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Shao, D., Wu, J., Li, Z. et al. Quantum Ring Infrared Photodetector Based On Droplet Epitaxy Technique. MRS Online Proceedings Library 1208, 924 (2009). https://doi.org/10.1557/PROC-1208-O09-24
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DOI: https://doi.org/10.1557/PROC-1208-O09-24