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Effect of oxide and nitride films on strength of silicon: A study using controlled small-scale flaws

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Abstract

Strength properties of silicon substrates containing dense oxide and nitride surface films are investigated using nanoindentations to introduce small flaws of predetermined scale. The indentation flaws provide favored sites for failure in subsequent flexure loading, even in the subthreshold region for indentations without visible corner cracking, confirming that microflaws generated within the indentation zone act as effective crack sources in the substrate. Deposition of the oxide films increases the strength while the nitride films diminish it at any given indentation load. The strength shifts are attributed primarily to the presence of residual compressive stress in the oxide, tensile stress in the nitride. A fracture mechanics formulation based on a previous analysis for monolithic substrates is here adapted to allow for a superposed crack closing or opening stress-intensity factor term associated with the residual stresses. Allowance is also made in the mechanics for the influence of the film on effective hardness and modulus of the substrate. The formulation accounts for the basic strength shifts and enables evaluation of the magnitude of the residual stresses. The results quantify the susceptibility of basic device materials to damage from small-scale contacts and impacts.

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Authors and Affiliations

  1. Materials Science and Engineering Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland, 20899-8500, USA

    Yeon-Gil Jung, Antonia Pajares & Brian R. Lawn

Authors
  1. Yeon-Gil Jung
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  2. Antonia Pajares
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  3. Brian R. Lawn
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Correspondence to Brian R. Lawn.

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Jung, YG., Pajares, A. & Lawn, B.R. Effect of oxide and nitride films on strength of silicon: A study using controlled small-scale flaws. Journal of Materials Research 19, 3569–3575 (2004). https://doi.org/10.1557/JMR.2004.0454

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  • DOI: https://doi.org/10.1557/JMR.2004.0454

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