Abstract
A very high vacuum compatible microwave plasma chemical vapor deposition system has been fabricated for the growth of diamond thin films. Microcrystalline diamond thin films have been grown on silicon substrates from the CH4−H2 gas mixture. Scanning electron microscopy and x-ray diffraction have been used to study the surface morphology and the crystallographic structure of the films. Optical emission spectroscopy has been used for the detection of chemical species present in the plasma. The strong dependence of the film microstructure on the intensity of CH emission line has been observed.
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References
J. C. Angus, Thin Solid Films 216, 126 (1992).
K. E. Spear, J. Am. Ceram. Soc. 72 (2), 171 (1989).
W. A. Yarbrough and R. Messier, Science 247, 688 (1990).
K. Kobashi, K. Nishimura, Y. Kawate, and T. Horiuchi, Phys. Rev. B 38 (6), 4067 (1988).
C. V. Deshpandey and R. F. Bunshah, J. Vac. Sci. Technol. A 7 (3), 2294 (1989).
P. G. Partridge, P. W. May, C. A. Rego, and M. N. R. Ashfold, Mater. Sci. Technol. 10, 505 (1994).
M. Kamo, Y. Sato, S. Matsumoto, and N. Setaka, J. Cryst. Growth 62, 642 (1983).
R. Ramesham and T. Roppel, J. Mater. Res. 7, 1144 (1992).
R. Ramesham and C. Ellis, J. Mater. Res. 7, 1189 (1992).
Y. Mitsuda, T. Yoshida, and K. Akashi, Rev. Sci. Instrum. 60 (2), 249 (1989).
Y. Saito, S. Matsuda, and S. Nogita, J. Mater. Sci. Lett. 5, 565 (1986).
Y. Mitsuda, Y. Kojima, T. Yoshida, and K. Akashi, J. Mater. Sci. 22, 1557 (1987).
S. W. Reeve and W. A. Weimer, Thin Solid Films 236, 91 (1993).
O. Matsumoto, H. Toshima, and Y. Kanzaki, Thin Solid Films 128, 341 (1985).
J. Wagner, Ch. Wild, F. Pohl, and P. Koidl, Appl. Phys. Lett. 48 (2), 106 (1986).
Y. Mitsuda, K. Tanaka, and T. Yoshida, J. Appl. Phys. 67 (8), 3604 (1990).
G. Balestrino, M. Marinelli, E. Milani, A. Paoletti, I. Pinter, A. Tebano, and P. Paroli, Appl. Phys. Lett. 62 (8), 879 (1993).
M. Marinelli, E. Milani, M. Montuori, A. Paoletti, A. Tebano, and G. Balestrino, J. Appl. Phys. 76 (10), 5702 (1994).
A. R. Badzian, Advances in X-Ray Analysis, edited by C. S. Barrett (Plenum, New York, 1988), Vol. 31, p. 113.
J. H. Je and G. Y. Lee, J. Mater. Sci. 27, 6324 (1992).
M. Weiler, R. Kleber, K. Jung, and H. Ehrhardt, Diamond Relat. Mater. 1, 121 (1992).
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Barshilia, H.C., Mehta, B.R. & Vankar, V.D. Growth of diamond thin films by microwave plasma chemical vapor deposition process. Journal of Materials Research 11, 1019–1024 (1996). https://doi.org/10.1557/JMR.1996.0127
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DOI: https://doi.org/10.1557/JMR.1996.0127