表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
特集:触媒CVD法による薄膜・プロセス技術
有機触媒CVDによる有機・無機ハイブリッド材料の低温成長
中山 弘
著者情報
ジャーナル フリー

2010 年 31 巻 4 号 p. 184-190

詳細
抄録

Organic catalytic CVD (O-Cat-CVD) is an extension of the conventional Cat-CVD technique to organic substances. O-Cat-CVD utilizes metal organic (MO) compounds as CVD sources and provides various types of organic-inorganic hybrid materials at low substrate temperature below 200oC. The growth instrument using high-melting-temperature metal filaments seems to be simple and easily scaled up. Chemical reactions at the hot filament, vapor phase reactions and substrate surface reaction must be taken into account. Although deep understanding is necessary to the mechanism of O-Cat-CVD growth, the method is quite promising as a key thin-film growth method in the industry like film-based electronics which provides various types of flexible devices such as flexible OLED and flexible solar cells using plastic film substrates.

著者関連情報

この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
前の記事 次の記事
feedback
Top