Multiplexed, High Density Electrophysiology with Nanofabricated Neural Probes
Figure 2
64 channel silicon-based neural probes with nanoscale leads.
(A–C) Three configurations of probes. Scale bars, 200 µm. (D) Gold recording sites and nanoscale leads, patterned with e-beam lithography. The lead width ranges from 1000 nm at the top lefthand corner, to 290 nm at the bottom righthand corner of the image. Scale bar, 50 µm. (E) A section of interconnecting leads belonging to the “honeycomb” array configuration displayed in (A) and (D). The narrowest traces have width and spacing of 290 nm. Scale bar, 5 µm. (F) Characteristic chisel-shaped profile of the probes resulting from deep reactive ion etching of silicon. Scale bar, 25 µm. (G) Silicon device cross-section.