Abstract
Phase masks are used in computational optical imaging for pupil encoding and point spread function (PSF) engineering. Continuous surface relief masks are fabricated by maskless lithography and demonstrated in double-helix PSF systems.
© 2011 Optical Society of America
PDF ArticleMore Like This
Sean Quirin, Ginni Grover, Callie Fiedler, and Rafael Piestun
NMB3 Novel Techniques in Microscopy (NTM) 2011
Ginni Grover, Sean Quirin, and Rafael Piestun
CThW4 CLEO: Science and Innovations (CLEO:S&I) 2011
Sreya Ghosh and Chrysanthe Preza
CTuB3 Computational Optical Sensing and Imaging (COSI) 2011