PECVD制备掺氮类金刚石薄膜的电化学特性<sup>*</sup>

doi:10.11901/1005.3093.2013.797

材料研究学报

2014, Vol. 28

Issue (3): 161-165 DOI: 10.11901/1005.3093.2013.797

本期目录 | 过刊浏览

PECVD制备掺氮类金刚石薄膜的电化学特性^*

周凯^1,²,柯培玲²,汪爱英²(

),邹友生¹

1. 南京理工大学材料科学与工程学院南京 210094
2. 中国科学院海洋新材料与应用技术重点实验室浙江省海洋材料与防护技术重点实验室
中国科学院宁波材料技术与工程研究所宁波 315201

Electrochemical Properties of Nitrogen-doped DLC Films Deposited by PECVD Technique

Kai ZHOU^1,²,Peiling KE²,Aiying WANG^2,^**(

),Yousheng ZOU¹

1. School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing, 210094
2. Key Laboratory of Marine Materials and Related Technologies, Zhejiang Key Laboratory of Marine Materials and Protective Technologies, Ningbo Institute of Materials Technologies and Engineering, Chinese Academy of Sciences, Ningbo, 315201

引用本文:

周凯,柯培玲,汪爱英,邹友生. PECVD制备掺氮类金刚石薄膜的电化学特性^*[J]. 材料研究学报, 2014, 28(3): 161-165.
Kai ZHOU, Peiling KE, Aiying WANG, Yousheng ZOU. Electrochemical Properties of Nitrogen-doped DLC Films Deposited by PECVD Technique[J]. Chinese Journal of Materials Research, 2014, 28(3): 161-165.

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摘要:

利用混合离子束系统, 通过辉光放电等离子体增强化学气相沉积(PECVD)方法制备出类金刚石薄膜(DLC)和掺氮类金刚石薄膜(N-DLC), 用可见拉曼光谱、X射线光电子能谱和扫描探针显微镜表征薄膜微观结构和表面形貌, 采用电化学工作站测量了薄膜的电化学性能。结果表明, DLC薄膜的表面光滑致密、粗糙度低, 掺氮增加了薄膜中的sp²团簇相并形成了C-N键, 并使C-O键含量和薄膜表面的活性位点增加。N-DLC薄膜电极在硫酸溶液中的电化学势窗达4.5 V和较低的背景电流(0.3±0.2 μA/cm²); 在铁氰化钾溶液中电极的电流响应明显, 表现为受扩散控制的准可逆过程。电极具有很好的重复性和稳定性。

关键词 ：无机非金属材料, PECVD, N-DLC, 微观结构, 电化学性能

Abstract：

Diamond-like carbon (DLC) and Nitrogen-doped diamond-like carbon (N-DLC) films were synthesized by glow discharge plasma enhanced chemical vapor deposition (PECVD) using a hybrid ion beam system. The microstructure and surface topography of films were characterized by Raman spectroscopy, X-ray photoemission spectroscopy and scanning probe microscopy. The electrochemical performance of the films was examined by an electrochemical workstation. Results indicate that the surface of all the deposited films is very smooth with low roughness. Nitrogen doping enhances the clustering of sp² sites and results in the formation of C-N bond, meanwhile, increases the amount of C-O bond and the surface active sites of films. N-DLC film electrode shows a wide potential window range over 4.5 V, lower background current (0.3±0.2 μA/cm²) in H₂SO₄ solution. N-DLC film electrode with good repeatability and stability displays significantly current response and nearly reversible electrode reaction in K₃Fe (CN)₆solution. Furthermore, the electrode reaction is controlled by diffusion process.

Key words： inorganic non-metallic materials PECVD N-DLC microstructure electrochemical properties

收稿日期: 2013-10-23

基金资助:* 国家重大基础研究计划2012CB933003, 国家自然科学基金51371187, 宁波市创新团队2011B81001 和中央高校基本科研业务费专项资金30920130111019 资助项目。

作者简介: 本文联系人: 汪爱英, 研究员

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图1 DLC和N-DLC薄膜的拉曼光谱

图2 DLC和N-DLC薄膜的XPS全谱图

图3 DLC和N-DLC薄膜的XPS C1s峰的拟合谱: 1、2、3、4分别代表sp2C-C、sp3C-C、C-O、C-N键

图4 DLC和N-DLC薄膜的AFM形貌图

图5 DLC和N-DLC薄膜电极在0.5 M H2SO4溶液中的循环伏安曲线(扫描速率0.05 V s-1)

图6 不同扫描速率下N-DLC薄膜电极在0.01 M K3Fe(CN)6和1 M KCl混合溶液中的循环伏安曲线,以及N-DLC薄膜电极阴极和阳极峰值电流密度和扫描速率平方根的关系

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