Influence of Substrates on Formation of Zinc Oxide Nanostructures by a Novel Reducing Annealing Method
ZnO thin films were deposited on different substrates including the quartz glass, silicon, sapphire and FTO glass by radio frequency magnetron sputtering. ZnO nanostructures could be fabricated on ZnO films which were formed on different substrates. The properties of as-deposited ZnO
films were significantly influenced by the substrates. It was found that ZnO films deposited on the silicon substrate showed the best crystallinity, and the following formed ZnO nanostructures showed the highest density and well-alignment as well. The mechanism of the structural properties
of ZnO deposition on different substrates was investigated.
Keywords: REDUCING ANNEALING; ZNO NANOSTRUCTURE
Document Type: Short Communication
Publication date: 01 February 2014
- Nanoscience and Nanotechnology Letters (NNL) is a multidisciplinary peer-reviewed journal consolidating nanoscale research activities in all disciplines of science, engineering and medicine into a single and unique reference source. NNL provides the means for scientists, engineers, medical experts and technocrats to publish original short research articles as communications/letters of important new scientific and technological findings, encompassing the fundamental and applied research in all disciplines of the physical sciences, engineering and medicine.
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