Spatially Resolved In Situ Diagnostics for Plasma-Enhanced Chemical Vapor Deposition Carbon Film Growth
In this paper we present the results of optical emission spectroscopy study of a plasma enhanced chemical vapor deposition of carbon films. The materials produced in this study were the diamond films, containing the pyramidal diamond crystallites, and the films, consisting of multi-wall
carbon nanotubes. These carbon films were deposited from a hydrogen and methane gas mixture activated by a direct current discharge. The optical emission spectra were recorded for different areas of the discharge plasma to provide a spatial mapping the gas-phase species concentrations and
electron temperatures. The obtained results are used for optimization of the deposition process and for developing the mechanisms explaining formation of the carbon materials with different properties.
Keywords: NANOCARBON; OPTICAL EMISSION SPECTROSCOPY; PLASMA-ENHANCED CVD
Document Type: Research Article
Publication date: 01 January 2012
- Journal of Nanoelectronics and Optoelectronics (JNO) is an international and cross-disciplinary peer reviewed journal to consolidate emerging experimental and theoretical research activities in the areas of nanoscale electronic and optoelectronic materials and devices into a single and unique reference source. JNO aims to facilitate the dissemination of interdisciplinary research results in the inter-related and converging fields of nanoelectronics and optoelectronics.
- Editorial Board
- Information for Authors
- Subscribe to this Title
- Ingenta Connect is not responsible for the content or availability of external websites
- Access Key
- Free content
- Partial Free content
- New content
- Open access content
- Partial Open access content
- Subscribed content
- Partial Subscribed content
- Free trial content