Preparation and Characterization of the Sputtered TiAlN Coatings Using a Ti–Al Alloy Metal Target
Titanium aluminium nitride (TiAlN) ternary coatings were deposited on glass substrates by means of reactive magnetron sputtering technique, using a Ti–Al alloy metal target (Ti0.5Al0.5). The depositions were performed at various N2 and Ar flux ratios of N2/(Ar
+ N2) ═ 33, 50, 67, 83%. The structure, morphology, chemical composition and mechanical properties were investigated by X-ray diffraction (XRD), field emission scanning electron microscope (FE-SEM), energy dispersive X-ray spectroscopy (EDS), and nano indenter (MTS System),
respectively. The orientation of coatings depends on the flux ratios of N2/(Ar + N2) and substrate temperature. The coatings deposited with N2/(Ar + N2) ratios of 33, 50 at.% consists of pyramid-like column grains separated by porous and voids, which
can be attributed to cubic-TiN (220) preferred orientation. The coatings deposited with N2/(Ar + N2) greater than 67% exhibits the phase of hexagonal-AlN and cubic-TiN. The surface of coatings becomes more compact and smoother with the N2/(Ar + N2)
ratios increase. The coatings deposited with N2/(Ar+N2) ratio of 83% shows the largest hardness of 21.5 GPa, which is attributed to the preferred (200) orientation. However, this hardness increases significantly with increasing substrate temperature. The coatings deposited
at more than 100 °C exhibited the (111) and/or (200) orientation. The amounts of grains grown along the (111) and (200) orientations play a significant role on the mechanical performance of TiAlN coatings. Four independent mechanisms, such as TiAlN stoichiometry and lattice parameter,
the (111) preferred growth orientation, and the density increases (elimination of void), were found to contribute to the enhancement of TiAlN mechanical performance.
Keywords: Hardness; Reactive Magnetron Sputtering; Titanium Aluminium Nitride (TiAlN)
Document Type: Research Article
Affiliations: 1: Department of Electronic and Electrical Engineering, Daegu Catholic University, Gyeongbuk 38430, Korea 2: Department of Advanced Materials and Chemical Engineering, Daegu Catholic University, Gyeongbuk 38430, Korea 3: Department of Creative IT Engineering, Pohang University of Science and Technology, Gyeongbuk 37673, Korea
Publication date: 01 October 2019
- Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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