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Operational Characteristics of Various AlGaN/GaN High Electron Mobility Transistor Structures Concerning Self-Heating Effect

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This study investigated DC characteristics of AlGaN/GaN high electron mobility transistors (HEMTs) considering self-heating effect (SHE) with basic T-gate (BT), drain-side extended T-gate (DSET), and source-bridge FP (SBFP) structures. We analyzed threshold voltage, transconductance, drain saturation current, and breakdown voltage of each structure for device optimization. Experimental data were initially matched with simulated data for the BT structure, then DC characteristics were compared with the drift-diffusion, coupled drift-diffusion and self-heating models for basic T-gate HEMT devices. Breakdown voltages were measured to identify the optimum DSET structure length, while increasing drain-side gate head to 3 ยตm. An SBFP was also employed where the DSET device showed highest breakdown voltage. Therefore, DC characteristics were compared for three structures and contrasted to reduce SHE. Hot spot and overall temperature were also analyzed for each structure.

Keywords: Breakdown Voltage; Field Plate; GaN; High Electron Mobility Transistor; Self-Heating Effect

Document Type: Research Article

Affiliations: Division of Electronics and Electrical Engineering, Dongguk University-Seoul, Seoul 04620, South Korea

Publication date: 01 October 2019

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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