Electrical and Optical Properties of NiO Composite Films by Radio Frequency Magnetron Sputtering

The 100-nm NiO–Ag composite films with Ag content of 0 to 24.4 at.% are deposited on glass substrates. It is found that an ultra high electric resistivity (ρ) value is obtained and cannot be detected by four point probe measurement when the Ag content is less than 3.4 at.%. The ρ value is reduced significantly to 29.0 Ω-cm as Ag content is increased to 4.2 at.%, and it decreases greatly to 0.009 Ω-cm as the content of Ag is further increased to 24.4 at.%. The NiO–Ag composite film with Ag content of 4.2 at.% shows p-type conduction. However, it becomes n-type when the Ag content increases to 9.3 at.%, which results from the Ag atoms segregated at grain boundary of NiO when the excess Ag atoms are added into NiO films. On the other hand, the transmittance of the NiO–Ag films drops continuously from 96.3% to 31.6% as the Ag content increases from 0 to 24.4%.