(Invited) Doping Silicon Dielectrics with Silicon, Cerium and Oxygen Via Ion Implantation

A. P. Knights¹, Rachel M. Savidge¹, Matthew P. Halsall² and Iain Forbes Crowe²

© 2013 ECS - The Electrochemical Society
ECS Meeting Abstracts, Volume MA2013-01, E3-Nanocrystal Embedded Dielectrics for Electronic and Photonic Devices Citation A. P. Knights et al 2013 Meet. Abstr. MA2013-01 793 DOI 10.1149/MA2013-01/18/793