Abstract
Three techniques for patterning of CVD diamond films are developed. First, predeposition patterning is performed by standard lithography using photoresist mixed with fine diamond particles to act as seed crystals. Second, substrates are masked either before ultrasonic treatment with diamond powder (which promotes nucleation), and the mask removed before diamond growth, or masked after treatment but before diamond deposition. Third, patterning of continuous diamond thin films by selective etching in oxygen at 700°C has been performed in a rapid thermal processor using 
or 
as masking layer. The selectivity and resolution was found to be good in all cases.