An Attempt to Quantify Electrodeposit Metallographic Growth Structures

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© 1997 ECS - The Electrochemical Society
, , Citation René Winand et al 1997 J. Electrochem. Soc. 144 428 DOI 10.1149/1.1837427

1945-7111/144/2/428

Abstract

A method is proposed to characterize quantitatively metallographic cross‐sectional structures of electrodeposits pertaining to the BR, FT, FT‐UD, and UD types in Fischer's classification which makes use of only three parameters to evaluate in three zones parallel to the substrate. The method is manual, but research is in progress to make it automatic on the basis of a specific image analysis program. The method should also be useful to characterize any structured deposit obtained by methods other than electrodeposition.

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10.1149/1.1837427