Abstract
We describe the fabrication processes of high-Tc Josephson junctions fabricated using the focused ion beam (FIB) technique, and the junction interfaces using cross-sectional transmission electron microscopy. This FIB technique has the two functions of etching and deposition. Using each of the FIB functions independently, and also together, we have fabricated junctions with three types of structures. The two types of junctions fabricated using each of the FIB functions independently are classified as grain boundary junctions with multi-grain boundaries, and the junction fabricated using both FIB functions is a proximity-effect type junction.