Jpn. J. Appl. Phys. 33 (1994) pp. L804-L806  |Next Article|  |Table of Contents|
|Full Text PDF (595K)| |Buy This Article|

Observation of Coulomb-Crystal Formation from Carbon Particles Grown in a Methane Plasma

Yasuaki Hayashi and Kunihide Tachibana

Department of Electronics and Information Science, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606

(Received April 4, 1994; accepted for publication April 28, 1994)

A Coulomb crystal was successfully formed as a result of the growth of spherical and monodisperse carbon particles suspended in a methane plasma. The crystal structure was confirmed to be hexagonal from top- and side-view photographs. The particle growth was monitored by Mie-scattering ellipsometry and correlated with the formation process of the Coulomb crystal. The liquid-to-solid phase transition occurred when particle diameter grew to 1.3 µm, and when the Wigner-Seitz radius was about 90 µm.

KEYWORDS: Coulomb crystal, phase transition, dusty plasma, carbon particles, Mie scattering, in-process ellipsometry
URL: http://jjap.ipap.jp/link?JJAP/33/L804/
DOI: 10.1143/JJAP.33.L804


|Full Text PDF (595K)| |Buy This Article|

References | Citing Articles (271)

  1. G. S. Selwyn, J. Heidenreich and K. L. Haller: Appl. Phys. Lett. 57 (1990) 1876[AIP Scitation].
  2. A. Bouchoule, A. Plain, L. Boufendi, J. Ph. Blondeau and C. Laure: J. Appl. Phys. 70 (1991) 1991[AIP Scitation].
  3. Y. Watanabe, N. Shiratani and N. Yamashita: Appl. Phys. Lett. 61 (1992) 1510[AIP Scitation].
  4. H. Ikezi: Phys. Fluids 29 (1986) 1764[AIP Scitation].
  5. H. Thomas, G. E. Morfill, V. Demmel, J. Goree, B. Feuerbacher and D. Mohlmann: to be published in Phys. Rev. Lett.
  6. Y. Hayashi and K. Tachibana: Jpn. J. Appl. Phys. 33 (1994) L476[IPAP].
  7. K. Tachibana, Y. Hayashi, T. Okuno and T. Tatsuta: to be published in Plasma Sources Sci. & Technol. 3 (1994).
  8. Y. Hayashi and K. Tachibana: Proc. 2nd Int. Conf. Reactive Plasmas and 11th Symp. on Plasma Process. Yokohama, 1994, to be published in Jpn. J. Appl. Phys. 33 (1994) Pt. 1, No. 7B.
  9. S. Ichimaru: Rev. Mod. Phys. 54 (1982) 1017[APS].
  10. W. L. Slattery, G. D. Doolen and H. E. DeWitt: Phys. Rev. A 21 (1980) 2087[APS].
  11. K. Tachibana, M. Nishida, H. Harima and Y. Urano: J. Phys. D 17 (1984) 1727[IoP STACKS].
  12. T. Tatsuta, T. Okuno and K. Tachibana: Proc. 8th Symp. on Plasma Process, Nagoya, 1991 (Division of Plasma Electronics, The Japan Society of Applied Physics, Kyoto, 1991) p. 77.

|TOP|  |Next Article|  |Table of Contents| |JJAP Home|
Copyright © 2008 The Japan Society of Applied Physics
Contact Information