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Deposition and characterization of organic polymer thin films using a dielectric barrier discharge with different C2Hm/N2 (m = 2, 4, 6) gas mixtures

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Abstract

Organic polymer thin films have been deposited on Si(100) and aluminum coated glass substrates by a dielectric barrier discharge (DBD) operated at medium pressure using different C2H m /N2 (m = 2, 4, 6) gas mixtures. The deposited films were characterized by various spectroscopic techniques. Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS) revealed the chemical functional groups present in the films. The surface chemical compositions have been derived from X-ray photo electron spectroscopy (XPS). FT-IRRAS and XPS show the presence of sp, s p 2 and s p 3 bonds of carbon and nitrogen. Various functional groups such as NH containing, saturated and unsaturated alkyl groups have been identified. Thin films obtained from C2H2/N2 and C2H4/N2 gas mixtures revealed a higher N/C ratio when compared to thin films obtained from C2H6/N2. Thickness, refractive index and extinction coefficient were evaluated by spectroscopic ellipsometry (SE). Significant differences between the films obtained with different gas mixtures are observed.

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Authors and Affiliations

  1. Institut für Physik, Ernst-Moritz-Arndt-Universität Greifswald, Felix-Hausdorff-Str. 6, 17489, Greifswald, Germany

    Thejaswini Halethimmanahally Chandrashekaraiah, Robert Bogdanowicz, Vladimir Danilov, Jürgen Meichsner & Rainer Hippler

  2. Faculty of Electronics, Telecommunication and Informatics, Gdansk University of Technology, 11/12 G. Narutowicza Str., 80-233, Gdansk, Poland

    Robert Bogdanowicz

  3. Leibniz-Institut für Plasmaforschung und Technologie, Felix-Hausdorff-Str. 2, 17489, Greifswald, Germany

    Jan Schäfer

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  1. Thejaswini Halethimmanahally Chandrashekaraiah
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  2. Robert Bogdanowicz
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  3. Vladimir Danilov
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  5. Jürgen Meichsner
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Correspondence to Rainer Hippler.

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Chandrashekaraiah, T.H., Bogdanowicz, R., Danilov, V. et al. Deposition and characterization of organic polymer thin films using a dielectric barrier discharge with different C2Hm/N2 (m = 2, 4, 6) gas mixtures. Eur. Phys. J. D 69, 142 (2015). https://doi.org/10.1140/epjd/e2015-50675-9

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  • DOI: https://doi.org/10.1140/epjd/e2015-50675-9

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