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High-precision nanoscale length measurement

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Abstract

Modern lithographical methods used to create linear measures for nanometer-range dimensions and the main factors which limit the applications of such gages have been analyzed in the paper. Prospects for developing high-precision measures based on an atomically structured crystalline surface (containing monoatomic steps) whose parameters are bound to the crystallographic parameters of the crystal (traceable to the length measure) are shown. A method which can be used to create such measures based on controlling the surface morphology of monocrystalline silicon at an atomic level due to the effects of self-organization arising at the atomically clean surface as a result of annealing in ultrahigh vacuum is proposed. A description of the set of high-precision gages of vertical dimensions STEPP-IFP-1 in a size range of 0.31–31 nm with an error in the whole interval of gages of less than 0.05 nm is presented. The set of high-precision gages after carrying out state testing is included into the state registry of measuring means as measuring type no. 48115-11 (Federal Agency on Technical Regulating and Metrology order no. 6290 of October 31, 2011).

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Authors and Affiliations

  1. Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, pr. Lavrentieva 13, Novosibirsk, 630090, Russia

    D. V. Sheglov, S. S. Kosolobov, L. I. Fedina, E. E. Rodyakina, A. K. Gutakovskii, S. V. Sitnikov, A. S. Kozhukhov & A. V. Latyshev

  2. Novosibirsk State University, Pirogova st. 2, Novosibirsk, 630090, Russia

    D. V. Sheglov, S. S. Kosolobov & A. V. Latyshev

  3. Siberian Research Institute of Metrology, pr. Dimitrova 4, Novosibirsk, 630004, Russia

    S. A. Zagarskikh, V. V. Kopytov, V. I. Evgrafov, G. V. Shuvalov & V. F. Matveichuk

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  1. D. V. Sheglov
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  2. S. S. Kosolobov
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Original Russian Text © D.V. Sheglov, S.S. Kosolobov, L.I. Fedina, E.E. Rodyakina, A.K. Gutakovskii, S.V. Sitnikov, A.S. Kozhukhov, S.A. Zagarskikh, V.V. Kopytov, V.I. Evgrafov, G.V. Shuvalov, V.F. Matveichuk, A.V. Latyshev, 2013, published in Rossiiskie Nanotekhnologii, 2013, Vol. 8, Nos. 7–8.

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Sheglov, D.V., Kosolobov, S.S., Fedina, L.I. et al. High-precision nanoscale length measurement. Nanotechnol Russia 8, 518–531 (2013). https://doi.org/10.1134/S1995078013040162

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