Abstract
Structure, optical properties, and resistance to sputtering are studied for a reflecting Mo-coating that is fabricated using magnetron deposition with simultaneous low-energy ion sputtering at the deposition rate that is higher than the etching rate. A Mo-polycrystalline mirror is used as a substrate. It is shown that the coating exhibits textured nanocrystalline structure with a relatively low spread of crystallite sizes and high resistance to sputtering. It is also demonstrated that the spectral reflection coefficient of such a Mo-coating differs from the spectral reflection coefficient of polycrystalline and single-crystalline Mo and the difference results from the effect of the structure of coating on its optical properties. A theoretical model of the coating formation is proposed.
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Original Russian Text © A.V. Rogov, Yu.V. Martynenko, Yu.V. Kapustin, S.S. Fanchenko, N.E. Belova, 2018, published in Zhurnal Tekhnicheskoi Fiziki, 2018, Vol. 88, No. 5, pp. 722–732.
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Rogov, A.V., Martynenko, Y.V., Kapustin, Y.V. et al. Analysis of the Mo/Mo Nanocrystalline Optical Coating Obtained with the Aid of Simultaneous Deposition and Ion Sputtering. Tech. Phys. 63, 700–710 (2018). https://doi.org/10.1134/S1063784218050195
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DOI: https://doi.org/10.1134/S1063784218050195