Abstract
In this two-part work, nanostructures formed in a three-step process of metal-assisted chemical etching of silicon are investigated. In the first part (present publication), the process of the chemical deposition of a layer of self-assembled silver nanoparticles on the surface of a silicon wafer (the first stage of metalassisted chemical etching) is studied. This layer, on the one hand, serves as a catalyst for the subsequent etching of silicon, and, on the other hand, represents a kind of mask for the formation of a certain topology of the emerging Si nanowires. The morphology of the obtained 40- to 60-nm-thick silver nanoparticle layers is investigated by scanning electron microscopy. The spectral dependences of the ellipsometric angles Ψ and Δ are measured using spectroscopic ellipsometry (λ = 250–900nm), and the complex dielectric function of the silver nanolayers is determined from these spectra. The dielectric function features a characteristic plasmon resonance peak in the ultraviolet spectral range. The study of the optical properties of Si nanofilament layers which form during the early stages of metal-assisted chemical etching will be reported as the second part of this work in a separate publication.
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Original Russian Text © Yu.A. Zharova, V.A. Tolmachev, A.I. Bednaya, S.I. Pavlov, 2018, published in Fizika i Tekhnika Poluprovodnikov, 2018, Vol. 52, No. 3, pp. 333–336.
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Zharova, Y.A., Tolmachev, V.A., Bednaya, A.I. et al. Surface Nanostructures Forming during the Early Stages of the Metal-Assisted Chemical Etching of Silicon. Optical Properties of Silver Nanoparticles. Semiconductors 52, 316–319 (2018). https://doi.org/10.1134/S1063782618030235
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DOI: https://doi.org/10.1134/S1063782618030235