Abstract
Technological modes in which high-efficiency GaAs: Si/GaAs: C tunneling structures can be fabricated by MOS-hydride epitaxy have been determined. It was demonstrated that use of C and Si dopants makes it possible to obtain a p-n junction with low diffusion spreading of dopant profiles. It was shown that fabrication of high-efficiency tunnel diodes requires that GaAs layers should be doped with acceptor and donor impurities to a level of ∼9 × 1019 cm−3. Tunnel diodes were fabricated using the tunnel structures and their current-voltage characteristics were studied. Peak current densities J p ≈ 1.53 kA cm−2 and a differential resistance R ≈ 30 mΩ under a reverse bias were obtained in the tunnel diodes.
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J. P. van der Ziel and W. T. Tsang, Appl. Phys. Lett. 41, 499 (1982).
J. Ch. Garsia, E. Rosencher, Ph. Collot, N. Laurent, J. L. Guyaux, B. Vinter, and J. Nagle, Appl. Phys. Lett. 71, 3752 (1997).
S. G. Patterson, G. S. Petrich, R. J. Ram, and L. A. Kolodziejski, Electron. Lett. 35, 395 (1999).
C. Hanke, L. Korte, B. D. Acklin, M. Behringer, G. Herrmann, J. Luff, B. De Odorico, M. Marchiano, and J. Wilhelmi, Proc. SPIE 3947, 50 (2000).
S. G. Patterson, E. K. Lau, K. P. Pipe, and R. J. Ram, Appl. Phys. Lett. 77, 172 (2000).
H. C. Casey and M. B. Panish, Heterostructure Lasers (Academic Press, New York, San Francisco, London, 1978), vol. 1.
V. V. Pasynkov and L. K. Chirkin, Semiconductor Devices (Vyssh. Shkola, Moscow, 1987), p. 177 [in Russian].
I. M. Vikulin and V. I. Stafeev, Physics of Semiconductor Devices (Sov. radio, Moscow, 1980), p. 10 [in Russian].
N. Watanabe, H. Ito, and T. Ishibashi, J. Cryst. Growth 147, 256 (1995).
H. Li, F. Reinhardt, and S. Macomber, J. Cryst. Growth 256, 52 (2003).
V. M. Lantratov, N. A. Kalyuzhnyĭ, S. A. Mintairov, N. Kh. Timoshina, M. Z. Shvarts, and V. M. Andreev, Fiz. Tekh. Poluprovodn. 41, 751 (2007) [Semiconductors 41, 727 (2007)].
D. A. Vinokurov, S. A. Zorina, V. A. Kapitonova, A. V. Murashova, D. N. Nikolaev, A. L. Stankevich, M. A. Khomylev, V. V. Shamakhov, A. Yu. Leshko, A. V. Lyutetskiĭ, T. A. Nalet, N. A. Pikhtin, S. O. Slipchenko, Z. N. Sokolova, N. V. Fetisova, and I. S. Tarasov, Fiz. Tekh. Poluprovodn. 39, 388 (2005) [Semiconductors 39, 370 (2005)].
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Original Russian Text © D.A. Vinokurov, M.A. Ladugin, A.A. Marmalyuk, A.A. Padalitsa, N.A. Pikhtin, V.A. Simakov, A.V. Sukharev, N.V. Fetisova, V.V. Shamakhov, I.S. Tarasov, 2009, published in Fizika i Tekhnika Poluprovodnikov, 2009, Vol. 43, No. 9, pp. 1253–1256.
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Vinokurov, D.A., Ladugin, M.A., Marmalyuk, A.A. et al. A study of GaAs: Si/GaAs: C tunnel diodes grown by MOCVD. Semiconductors 43, 1213–1216 (2009). https://doi.org/10.1134/S1063782609090206
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DOI: https://doi.org/10.1134/S1063782609090206