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X-ray photoelectron spectroscopy for nondestructive analysis of buried interfaces

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Abstract

The possibility to use high energy X-ray photoelectron spectroscopy as a nondestructive method of in-depth chemical phase analysis of solids is demonstrated. Theoretical background and optimal experimental conditions of in-depth analysis are considered. Interfaces in 5 nm thick HfO2 films synthesized by molecular layering and deposition of organometallic compounds from the gas phase were studied. It was shown that thickness of the layers in multilayer structures can be determined by measuring the intensity of photoelectron peaks.

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Authors and Affiliations

  1. St.-Petersburg State University, St.-Petersburg, Russia

    E. O. Filatova & A. A. Sokolov

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  1. E. O. Filatova
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  2. A. A. Sokolov
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Correspondence to E. O. Filatova.

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Original Russian Text Copyright © 2011 by E. O. Filatova and A. A. Sokolov

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Translated from Zhurnal Strukturnoi Khimii, Vol. 52, Supplement, pp. S85–S93, 2011.

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Filatova, E.O., Sokolov, A.A. X-ray photoelectron spectroscopy for nondestructive analysis of buried interfaces. J Struct Chem 52 (Suppl 1), 82–89 (2011). https://doi.org/10.1134/S0022476611070122

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