Abstract
The photoluminescence of strained InGaAlAs/InGaAs/InP heterostructures with an active region consisting of nine In0.74Ga0.26As quantum wells and δ-doped In0.53Al0.20Ga0.27As barrier layers grown by molecular beam epitaxy on an InP(100) substrate is investigated. Analysis of the photoluminescence spectra demonstrates that p-type doping leads to an increase in the photoluminescence efficiency at low excitation levels in comparison to a heterostructure with undoped barriers, and increasing the level of barrier doping to (1–2) × 1012 cm–2 results in the suppression of nonradiative recombination.
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ACKNOWLEDGMENTS
This study was supported by the Ministry of Education and Science of the Russian Federation in the framework of the Federal Targeted Program “Research and Development in Priority Areas for the Russian Science and Technology Complex 2014–2020” (agreement no. 14.578.21.0253, unique identifier RFMEFI57817X0253).
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Translated by M. Skorikov
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Kolodeznyi, E.S., Kurochkin, A.S., Rochas, S.S. et al. On the Impact of Barrier-Layer Doping on the Photoluminescence Efficiency of InGaAlAs/InGaAs/InP Strained-Layer Heterostructures. Semiconductors 52, 1156–1159 (2018). https://doi.org/10.1134/S1063782618090075
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DOI: https://doi.org/10.1134/S1063782618090075