Note to users. If you're seeing this message, it means that your browser cannot find this page's style/presentation instructions -- or possibly that you are using a browser that does not support current Web standards. Find out more about why this message is appearing, and what you can do to make your experience of our site the best it can be.
CareStream

Site Tools

  • AAAS
  • Subscribe
  • Feedback

Site Search

Search Advanced

Science 3 March 2006:
Vol. 311. no. 5765, pp. 1272 - 1274
DOI: 10.1126/science.1120224
Prev | Table of Contents | Next

Reports

Surface Self-Organization Caused by Dislocation Networks

Konrad Thürmer,* Robert Q. Hwang,{dagger} Norman C. Bartelt

We report a new mechanism of self-organization that can lead to robust surface ordering. We have quantitatively analyzed the thermal motion of holes created by sulfur atoms in a silver monolayer on a ruthenium surface, which we observed in real time with scanning tunneling microscopy. We find that the stability of the array of holes is determined by the arrangement and structure of misfit dislocations in the film.

Sandia National Laboratories, Livermore, CA 94550, USA.

{dagger} Present address: Brookhaven National Laboratory, Upton, NY 11973, USA.

* To whom correspondence should be addressed. E-mail: kthurme{at}sandia.gov

Read the Full Text

ADVERTISEMENT
Click Me!

ADVERTISEMENT
Click Me!

To Advertise     Find Products

Science. ISSN 0036-8075 (print), 1095-9203 (online)