Process challenges in advanced photomask etch processes

Chang Ju Choi; Karmen Yung; Cheng-Hsin Ma; Ganesh Vanamu

doi:10.1117/12.977137

8 November 2012 Process challenges in advanced photomask etch processes

Chang Ju Choi, Karmen Yung, Cheng-Hsin Ma, Ganesh Vanamu

Proceedings Volume 8522, Photomask Technology 2012; 85220Q (2012) https://doi.org/10.1117/12.977137
Event: SPIE Photomask Technology, 2012, Monterey, California, United States

Abstract

Plasma etch challenges such as resolution enhancement, etch error reduction, and process reliability improvement are investigated in next generation phase shift photomask processes for ≤14nm technology node. Etch resolution predominantly depends on etch bias and linearity while overall process resolution is also determined by resist thickness. Several resolution enhancement techniques including thin hardmasks and new absorber materials are tested in terms of etch profile, linearity, and minimum feature printability. New approaches provide improvement on etch bias as well as good pattern fidelity for sub-resolution patterns. Reduction of etch profile errors is also critical to maintain high pattern resolution. It is found that some of etch profile distortion can be minimized by changing plasma conditions. To meet tighter process reliability requirement, we investigated a couple of advanced process control techniques in alternating phase shift mask manufacturing. Integration of real-time monitor is essential to obtain good process reliability with no degradation on defects or throughput.

Citation Download Citation

Chang Ju Choi, Karmen Yung, Cheng-Hsin Ma, and Ganesh Vanamu "Process challenges in advanced photomask etch processes", Proc. SPIE 8522, Photomask Technology 2012, 85220Q (8 November 2012); https://doi.org/10.1117/12.977137

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Etching

Plasma

Chromium

Plasma etching

Resolution enhancement technologies

Photomasks

Reliability

Show All Keywords

Keywords/Phrases

Search In:

Publication Years