Bidirectional Method For Optical Channel Waveguide Attenuation Measurement By Detectors Integrated On The Wafer

Jaakko Aarnio; Matti Leppihalme

doi:10.1117/12.963331

5 January 1990 Bidirectional Method For Optical Channel Waveguide Attenuation Measurement By Detectors Integrated On The Wafer

Jaakko Aarnio, Matti Leppihalme

Author Affiliations +

Proceedings Volume 1177, Integrated Optics and Optoelectronics; (1990) https://doi.org/10.1117/12.963331
Event: OE/FIBERS '89, 1989, Boston, United States

Abstract

A new on-wafer bidirectional nondestructive measurement method is demonstrated for measuring losses in three dimensional integrated optical waveguides. A thermally oxidized silicon wafer is used as substrate for silicon nitride multimode waveguides. The measurement is based on p-i-n photodetectors integrated near the waveguide. In order to eliminate the effect of different sensitivities of adjacent p-i-n detectors, the light is launched separately to both ends of the waveguide. The method can be applied to test structures in optoelectronic integrated circuits (OEIC's).

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Jaakko Aarnio and Matti Leppihalme "Bidirectional Method For Optical Channel Waveguide Attenuation Measurement By Detectors Integrated On The Wafer", Proc. SPIE 1177, Integrated Optics and Optoelectronics, (5 January 1990); https://doi.org/10.1117/12.963331

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