Photoetching Of Polymers With Excimer Lasers

Y. S. Liu; H. S. Cole; H. R. Philipp; R. Guida

doi:10.1117/12.940398

1 September 1987 Photoetching Of Polymers With Excimer Lasers

Y. S. Liu, H. S. Cole, H. R. Philipp, R. Guida

Proceedings Volume 0774, Lasers in Microlithography; (1987) https://doi.org/10.1117/12.940398
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

Photoetching with excimer lasers has been studied in a variety of polymeric materials. Photoetching rates of polymers irradiated were measured at various laser wavelengths and fluences. The relationship of these results to the polymer absorption coefficient is examined. We propose that different mechanisms of photoetching may prevail, which depend on the absorption coefficient of the polymer. Potential use of this dry-etching process for lithography applications is evaluated.

Citation Download Citation

Y. S. Liu, H. S. Cole, H. R. Philipp, and R. Guida "Photoetching Of Polymers With Excimer Lasers", Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); https://doi.org/10.1117/12.940398

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available