Paper
15 October 2012 Theoretical study of drain current of AlInN/GaN HEMTs on SiC substrate
Author Affiliations +
Proceedings Volume 8549, 16th International Workshop on Physics of Semiconductor Devices; 85490S (2012) https://doi.org/10.1117/12.927259
Event: 16th International Workshop on Physics of Semiconductor Devices, 2011, Kanpur, India
Abstract
A new heterostructure based on AlxIn1-xN/GaN high electron mobility transistor (HEMT) on SiC substrate has been proposed for high frequency, where it offers the best performance in comparison to other two heterostructures like on AlxGa1-xN/GaN and InxGa1-xN/GaN. We have investigated the effect of different higher output characteristics in comparison to conventional AlxGa1-xN/GaN and InxGa1-xN/GaN with the AlxIn1-xN/GaN heterostructure, where the drain current is maximum for AlxIn1-xN/GaN and AlxGa1-xN/GaN heterostructure HEMT respectively for the same barrier thickness and for the same gate source voltage.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Md. Iqbal Hossain, Khandakar Nusrat Islam, Chandan Qumar Howlader, and Zahid Hasan Mahmood "Theoretical study of drain current of AlInN/GaN HEMTs on SiC substrate", Proc. SPIE 8549, 16th International Workshop on Physics of Semiconductor Devices, 85490S (15 October 2012); https://doi.org/10.1117/12.927259
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KEYWORDS
Field effect transistors

Dielectric polarization

Heterojunctions

Silicon carbide

Gallium nitride

Polarization

Aluminum

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